Park Systems has introduced the Park NX-IR R300, a nanoscale infrared (IR) spectroscopy system for industrial applications. The Park NX-IR R300 is an infrared spectroscopy and atomic force microscopy integrated into one, for up to 300 mm semiconductor wafers. It provides chemical property information as well as mechanical and topographical data for semiconductor research, failure analysis and defect characterisation at an unprecedent high nano resolution.
The Park NX-IR R300 combines IR spectroscopy of photo-induced force microscopy (PIFM) onto the Park NX20 300 mm AFM platform. The PIFM spectroscopy provides chemical identification under 10 nm spatial resolution. It uses a non-contact technique that offers damage-free spectroscopy probing, highest resolution and accuracy throughout scans. Furthermore, the Park PIFM provides the user with spectroscopy information at varying depths, offering invaluable insight into sample composition.