HPQ3 and HPQ3S gas analysers

MKS Instruments has announced the availability of their high-pressure, compact HPQ3 and HPQ3S residual gas analysers. These analysers are robust, sensitive and fast PVD chamber sensors that do not require differential pumping, employing field-proven technology and an innovative electronics platform for greater flexibility and cost efficiency, offering high levels of automation. The interface with tool and factory process control uses the TOOLweb sensor platform, a specialised turn-key tool-integration software that allows complete integration, providing web-based reporting and levels of control, from passive monitoring of the tool vacuum to process critical go/no go management of individual process chambers. The HPQ3 can provide data for processes up to a total pressure of 1.3–3mbar while the HPQ3S can be used for specific higher pressure applications up to 1e–2 mbar.

MKS Instruments
Issue: 24-03
RSN: 138


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