A new monobloc assembly on the Hiden Analytical HPR-30 series of process gas analysers provides twin conductance paths allowing base pressure measurements and process measurements with the same configuration. Advanced control with auto-switching of the twin inlets via the MASsoft operating program enables this dual monitoring role to be completed without user intervention. The analysers are fully configurable for individual process applications such as CVD, plasma etching, MOCVD, process gas purity and in-process contaminant monitoring. Options include the 3F series triple filter quadrupole system providing enhanced sensitivity, ppb detection levels and high contamination resistance.

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